报告题目：Application of aberration retrieval and image restoration to scanning electron microscope
报告人：邵屹峰 博士 荷兰代尔夫特理工大学&荷兰ASML公司
Scanning electron microscope (SEM) has been becoming an essential wafer metrology tool as the feature size of semiconductor manufacturing keeps shrinking. In order to obtain the topology of the features printed on the wafer, lower landing energy (longer wavelength) SEM is preferred. For this application, the resolution is severely limited by the aberrations. In this talk, we introduce an image based method for retrieving the aberrations of an SEM. This method takes several images both in- and out-of-focus. No prior information of the sample is required.
Yifeng Shao is currently a post-doc researcher in a joint project between the Optics Research Group at Delft University of Technology and the Research Department at ASML. He received a bachelor’s degree from Sun Yat-sen university, and two master’s degrees from Institute d’Optique Graduate School in France and from Delft University of Technology in the Netherlands. During 2013 – 2018, he studied in the Optics Research Group at Delft university of Technology as a PhD candidate. His PhD project involves the study of optical system design methodology and computational imaging algorithms. Currently he is working on optical metrology applications for semiconductor industry.